The NanoTech Complex houses more than 120 wafer processing and inline metrology tools. The prominently sited NFX communicates the power of the collaborative public-private partnership spearheaded by SUNY Polytechnic, as well as the promise of new technologies under development. A pedestrian walkway with floor to ceiling glass walls and utility umbilical connects the structure with NanoFab North.

The 500,000 SF NFX provides 50,000 SF of class 1,000 cleanroom space for manufacturing that houses the most sophisticated, next-generation computer chip manufacturing tools in the world and has enabled the next generation of 450mm computer chip wafer production. To support testing and advance research and development, NFX also houses two data centers; 5,000 SF of meteorology labs; and 20,000 SF of office and conference space. Select sub-areas of the cleanroom are class 100-capable.

The SUNY Poly facilities also house 300mm advanced lithography platforms to support 193nm immersion lithography development and EUV lithography development. Also installed are advanced wafer platforms for planarization, copper plating, etch development, ion implantation, thin film development and wet cleaning technology.